STRUCTURE AND METHOD FOR SUB-RESOLUTION DUMMY CLEAR SHAPES FOR IMPROVED GATE DIMENSIONAL CONTROL

• Main Authors: SUCHARITAVES JEANNE-TANIA, PARKER DAVID P, LANDIS HOWARD S
• Format: Patent
• Language: English
• Published: 18.09.2008
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A mask system for use by a lithographic system to project an image of a circuit design. The design includes at least one large feature and at least one nearby small feature. The mask comprises one or more shapes on a mask to project an image of the nearby small feature and, on the same mask or on a...