Transient enhanced atomic layer deposition
A process in which a wafer is exposed to a first chemically reactive precursor dose insufficient to result in a maximum saturated ALD deposition rate on the wafer, and then to a second chemically reactive precursor dose, the precursors being distributed in a manner so as to provide substantially uni...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
05.06.2008
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Subjects | |
Online Access | Get full text |
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