Arc source and magnet configuration

• Main Authors: HAGMANN JURG, GWEHENBERGER JUERGEN, KRASSNITZER SIEGFRIED
• Format: Patent
• Language: English
• Published: 15.05.2008
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

The invention relates to an arc source with a target ( 1 ) having a target front face ( 2 ) for the vacuum vaporization of the target material, a target backside with a cooling plate ( 4 ), a central target region (Z) as well as a target margin. The arc source further comprises a magnet configuration ( 8, 9 ) with an inner magnet system ( 8 ) and/or an outer magnet system ( 9 ) for the generation of a magnetic field in the proximity of the target front face. At least one of the magnet systems ( 8 ) is herein radially poled and effects alone or in connection with the particular other magnet system that the field lines of the magnetic field extend here substantially parallel to the target front face ( 2 ).