Fluorocopolymer, method for its production and resist composition containing it

A fluorocopolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene and units derived from a monomer unit formed by cyclopolymerization of a functional group-containing fluorinated diene having a specific structure or a monomer unit formed by polymerizatio...

Full description

Saved in:
Bibliographic Details
Main Authors YOKOKOJI OSAMU, TAKEBE YOKO, EDA MASATAKA
Format Patent
LanguageEnglish
Published 12.04.2007
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CHEMISTRY
CINEMATOGRAPHY
COMPOSITIONS BASED THEREON
COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS
MATERIALS THEREFOR
METALLURGY
ORGANIC MACROMOLECULAR COMPOUNDS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
THEIR PREPARATION OR CHEMICAL WORKING-UP
Online AccessGet full text

Cover

More Information
Summary:A fluorocopolymer having units derived from a monomer unit formed by cyclopolymerization of a fluorinated diene and units derived from a monomer unit formed by cyclopolymerization of a functional group-containing fluorinated diene having a specific structure or a monomer unit formed by polymerization of an acrylic monomer having a specific structure, a method for its production, and a resist composition.
Bibliography:Application Number: US20060593549