Method and apparatus for precision coating of molecules on the surfaces of materials and devices

• Main Authors: RATNER BUDDY D, ELAM WILLIAM T, LEE HAK-NO, TURECEK FRANK, KITCHING KATHRYN J
• Format: Patent
• Language: English
• Published: 15.02.2007
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

A method and apparatus for plasma treatment and deposition of ionized molecules on a surface of an object in a vacuum. The apparatus has a plasma treatment system including a plasma reactor chamber, an ion deposition system including an ion deposition chamber that is connected to the plasma reactor chamber, and a vacuum system for maintaining a vacuum in the chambers. The ion deposition system may include an ion guide chamber for guiding ionized molecule towards the target surface. A target guiding system moves the target surface between the plasma reactor chamber and the ion deposition chamber within the vacuum system through a gate, such that the target surface may be alternately subjected to plasma treatment and to deposition of ionized molecules without leaving the vacuum system.