Method and apparatus for precision coating of molecules on the surfaces of materials and devices
A method and apparatus for plasma treatment and deposition of ionized molecules on a surface of an object in a vacuum. The apparatus has a plasma treatment system including a plasma reactor chamber, an ion deposition system including an ion deposition chamber that is connected to the plasma reactor...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
15.02.2007
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Subjects | |
Online Access | Get full text |
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Summary: | A method and apparatus for plasma treatment and deposition of ionized molecules on a surface of an object in a vacuum. The apparatus has a plasma treatment system including a plasma reactor chamber, an ion deposition system including an ion deposition chamber that is connected to the plasma reactor chamber, and a vacuum system for maintaining a vacuum in the chambers. The ion deposition system may include an ion guide chamber for guiding ionized molecule towards the target surface. A target guiding system moves the target surface between the plasma reactor chamber and the ion deposition chamber within the vacuum system through a gate, such that the target surface may be alternately subjected to plasma treatment and to deposition of ionized molecules without leaving the vacuum system. |
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Bibliography: | Application Number: US20060582615 |