Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirements

• Main Authors: BLATCHFORD JAMES W, JESSEN SCOTT W
• Format: Patent
• Language: English
• Published: 01.02.2007
• Subjects: CALCULATING; COMPUTING; COUNTING; ELECTRIC DIGITAL DATA PROCESSING; PHYSICS

Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein...