Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirements
Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
01.02.2007
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!