Method for performing place-and-route of contacts and vias in technologies with forbidden pitch requirements

Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein...

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Bibliographic Details
Main Authors BLATCHFORD JAMES W, JESSEN SCOTT W
Format Patent
LanguageEnglish
Published 01.02.2007
Subjects
CALCULATING
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
PHYSICS
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Summary:Provide is a method of making a mask layout, an integrated circuit device made by a method, a computer readable medium, and a mask for forming contact holes. The method can comprise patterning a first feature along a first axis, determining a first set of areas adjacent to the first feature, wherein each of the areas in the first set of areas is within a first angle away from the first axis, and wherein each of the areas in the first set of areas is within a first distance away from the first feature, and patterning a second feature in at least one of the first set of areas so as to form a mask layout, wherein each of the first feature and the second feature are one of a virtual feature and a real feature.
Bibliography:Application Number: US20050191078