Apparatus and methods for isolating chemical vapor reactions at a substrate surface
An apparatus and method for processing a substrate is provided. The apparatus comprises a reaction chamber, a substrate holder within the chamber, and first and second injector components. The reaction chamber has an upstream end and a downstream end, between which the substrate holder is positioned...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
07.12.2006
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Subjects | |
Online Access | Get full text |
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