Exposure apparatus and method of manufacturing device

At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path spa...

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Bibliographic Details
Main Authors FURUMOTO HIDEKAZU, TO HIROMITSU
Format Patent
LanguageEnglish
Published 21.09.2006
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Abstract At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space which is deflected by a rectifier to direct the flow outside of the optical path space.
AbstractList At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space which is deflected by a rectifier to direct the flow outside of the optical path space.
Author TO HIROMITSU
FURUMOTO HIDEKAZU
Author_xml – fullname: FURUMOTO HIDEKAZU
– fullname: TO HIROMITSU
BookMark eNrjYmDJy89L5WQwda0oyC8uLUpVSCwoSCxKLCktVkjMS1HITS3JyE9RyE9TyE3MK01LTC4pLcrMS1dISS3LTE7lYWBNS8wpTuWF0twMym6uIc4euqkF-fGpxQWJyal5qSXxocFGBgZmRgaWRuYmjobGxKkCAEk9MCc
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US2006209274A1
GroupedDBID EVB
ID FETCH-epo_espacenet_US2006209274A13
IEDL.DBID EVB
IngestDate Fri Jul 19 13:54:40 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US2006209274A13
Notes Application Number: US20060356798
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060921&DB=EPODOC&CC=US&NR=2006209274A1
ParticipantIDs epo_espacenet_US2006209274A1
PublicationCentury 2000
PublicationDate 20060921
PublicationDateYYYYMMDD 2006-09-21
PublicationDate_xml – month: 09
  year: 2006
  text: 20060921
  day: 21
PublicationDecade 2000
PublicationYear 2006
RelatedCompanies CANON KABUSHIKI KAISHA
RelatedCompanies_xml – name: CANON KABUSHIKI KAISHA
Score 2.6543138
Snippet At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield...
SourceID epo
SourceType Open Access Repository
SubjectTerms ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
Title Exposure apparatus and method of manufacturing device
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20060921&DB=EPODOC&locale=&CC=US&NR=2006209274A1
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1ZS8NAEB5KPd80Kh5VFpS8BXNs0s1DEJuDIvTANtK3smk2UNAkmAT9-e5uD_vU1xkYZhfm3PlmAZ5wxpMgbJmaYROmYYcsNGJTXSOZnpoudRwmpwkHQ6cf47eZPWvB5wYLI_eE_sjliNyiFtzea-mvy_8mViBnK6vnZMlJxUs09QJ1Wx3rrmmoQc8Lx6Ng5Ku-78UTdfgueSZndvErr5UOeCLdFfYQfvQELqXcDSrRGRyOuby8PocWyxU48Td_rylwPFg_eStwJGc0FxUnru2wugA7_C0L0dtDtJTLu5sK0TxFq_-gUZGhL5o3ArQgUYgoZcIhXMJjFE79vsY1mW8PPo8nu2pbV9DOi5xdA-Jx2aZJYggUK7ZJQs2UEYtliZtinWTsBjr7JN3uZ9_B6arR4Gqm0YF2_d2wex566-RB3tgf_PuGzA
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LS8NAEB5KfdSbVqVq1QUlt2Aem3RzKGKTlKp9YRPprWySDQiaBJOgP9_N9mFPvc7AMLswz51vFuAexzwJwromqwZhMjZJKBODKjKJlUizqGkyMU04GpsDH7_MjXkNPtdYGLEn9EcsR-QWFXJ7L4S_zv6bWI6Yrcwfgg9OSh_7XteRNtWxYmmq5PS67nTiTGzJtrv-TBq_CZ7GmR38xGulPZ5kdyp7cN97FS4l2w4q_WPYn3J5SXECNZY0oWGv_15rwuFo9eTdhAMxoxnmnLiyw_wUDPc3S6veHqKZWN5d5ogmEVr-B43SGH3RpKxACwKFiCJWOYQzuOu7nj2QuSaLzcEX_mxbbf0c6kmasBYgHpcNGgRqhWLFBgmoFjGisziwIqyQmF1Ae5eky93sW2gMvNFwMXwev17B0bLpYMma2oZ68V2yax6Gi-BG3N4fexSJvw
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Exposure+apparatus+and+method+of+manufacturing+device&rft.inventor=FURUMOTO+HIDEKAZU&rft.inventor=TO+HIROMITSU&rft.date=2006-09-21&rft.externalDBID=A1&rft.externalDocID=US2006209274A1