Exposure apparatus and method of manufacturing device

At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path spa...

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Bibliographic Details
Main Authors FURUMOTO HIDEKAZU, TO HIROMITSU
Format Patent
LanguageEnglish
Published 21.09.2006
Subjects
ACCESSORIES THEREFOR
APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES
APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
PHOTOGRAPHY
PHYSICS
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Summary:At least one exemplary embodiment is directed to an exposure apparatus for exposing a substrate to light through an original plate including a shield configured to surround an optical path space of the exposure apparatus where a gas supply system is configured to supply gas into the optical path space which is deflected by a rectifier to direct the flow outside of the optical path space.
Bibliography:Application Number: US20060356798