Metal removal from solvent

An apparatus for cleaning a substrate. A cleaning chamber contacts the substrate with a cleaning solution. The cleaning solution thereby removes contaminants from the substrate and additionally leaches material from the substrate. A gettering chamber receives the cleaning solution, and includes a su...

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Bibliographic Details
Main Authors PIATT GREGORY F, GATOV MICHAEL S, WHITEFIELD BRUCE J
Format Patent
LanguageEnglish
Published 13.04.2006
Subjects
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