Fabrication of sub-50 nm solid-state nanostructures based on nanolithography

• Main Authors: MIRKIN CHAD A, ZHANG HUA, WEINBERGER DANA, HONG SEUNGHUN
• Format: Patent
• Language: English
• Published: 19.01.2006
• Subjects: LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; PERFORMING OPERATIONS; TRANSPORTING

Combination of nanolithography and wet chemical etching including the fabrication of nanoarrays of sub-50 nm gold dots and line structures with deliberately designed approximately 12-100 nm gaps. These structures were made by initially using direct write nanolithography to pattern the etch resist, 1...