Semiconductor processing equipment having improved process drift control

A plasma processing chamber including a slip cast part having a surface thereof exposed to the interior space of the chamber. The slip cast part includes free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by plasma in the interior spac...

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Bibliographic Details
Main Author WICKER THOMAS E
Format Patent
LanguageEnglish
Published 07.07.2005
Edition7
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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