Apparatus for cleaning semiconductor wafer and method for cleaning wafer using the same
An apparatus for cleaning a semiconductor wafer and method for cleaning a wafer using the same wherein, the apparatus includes a chamber on which a wafer is mounted, a revolving chuck mounted in the chamber for supporting and fixing the wafer, a nozzle for spraying cleaning solution onto the wafer,...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
09.09.2004
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Edition | 7 |
Subjects | |
Online Access | Get full text |
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