Method of manufacturing electron-emitting device, method of manufacturing electron source, and method of manufacturing image-forming apparatus

An electron-emitting device comprises an electroconductive film including an electron-emitting region and a pair of electrodes for applying a voltage to the electroconductive film. The electron-emitting region is formed by applying a film of organic substance to the electroconductive film, carbonizi...

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Bibliographic Details
Main Author YAMANOBE MASATO
Format Patent
LanguageEnglish
Published 10.04.2003
Edition7
Subjects
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Summary:An electron-emitting device comprises an electroconductive film including an electron-emitting region and a pair of electrodes for applying a voltage to the electroconductive film. The electron-emitting region is formed by applying a film of organic substance to the electroconductive film, carbonizing the organic substance by electrically energizing the electroconductive film, and forming a fissure or fissures in the electroconductive film prior to the carbonization. The electron-emitting device constitutes an electron source having a plurality of electron-emitting devices, and further an image-forming device comprising an electron source and an image-forming member arranged in an envelope.
Bibliography:Application Number: US20020299659