Methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers

• Main Authors: Bobek, Sarah Michelle, Limdulpaiboon, Ratsamee, Kioussis, Dimitri, Nittala, Krishna, Lee, Kwangduk Douglas, Janakiraman, Karthik
• Format: Patent
• Language: English
• Published: 29.10.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Aspects generally relate to methods, systems, and apparatus for processing substrates using one or more amorphous carbon hardmask layers. In one aspect, film stress is altered while facilitating enhanced etch selectivity. In one implementation, a method of processing a substrate includes depositing...