Self-aligned formation of angled optical device structures
Embodiments described herein provide for methods of forming angled optical device structures. The methods described herein utilize etching a mandrel material with an etch chemistry that is selective to the hardmask, i.e., the mandrel material is etched at a higher rate than the hardmask. Therefore,...
Saved in:
Main Authors | , |
---|---|
Format | Patent |
Language | English |
Published |
06.02.2024
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!