Integrated circuit devices

A method of manufacturing an integrated circuit device, the method including forming a plurality of target patterns on a substrate such that an opening is defined between two adjacent target patterns; forming a pyrolysis material layer on the substrate such that the pyrolysis material layer partiall...

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Main Authors Kim, Munjun, Lee, Seungheon, Han, Taejong, Koh, Jaekang, Kwon, Hyukwoo
Format Patent
LanguageEnglish
Published 19.09.2023
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Abstract A method of manufacturing an integrated circuit device, the method including forming a plurality of target patterns on a substrate such that an opening is defined between two adjacent target patterns; forming a pyrolysis material layer on the substrate such that the pyrolysis material layer partially fills the opening and exposes an upper surface and a portion of a sidewall of the two adjacent target patterns; and forming a material layer on the exposed upper surface and the exposed portion of the sidewall of the two adjacent target patterns, wherein, during the forming of the material layer, the material layer does not remain on a resulting surface of the pyrolysis material layer.
AbstractList A method of manufacturing an integrated circuit device, the method including forming a plurality of target patterns on a substrate such that an opening is defined between two adjacent target patterns; forming a pyrolysis material layer on the substrate such that the pyrolysis material layer partially fills the opening and exposes an upper surface and a portion of a sidewall of the two adjacent target patterns; and forming a material layer on the exposed upper surface and the exposed portion of the sidewall of the two adjacent target patterns, wherein, during the forming of the material layer, the material layer does not remain on a resulting surface of the pyrolysis material layer.
Author Kwon, Hyukwoo
Lee, Seungheon
Han, Taejong
Kim, Munjun
Koh, Jaekang
Author_xml – fullname: Kim, Munjun
– fullname: Lee, Seungheon
– fullname: Han, Taejong
– fullname: Koh, Jaekang
– fullname: Kwon, Hyukwoo
BookMark eNrjYmDJy89L5WSQ8swrSU0vSixJTVFIzixKLs0sUUhJLctMTi3mYWBNS8wpTuWF0twMim6uIc4euqkF-fGpxQWJyal5qSXxocGGhuZmJoaGlk5GxsSoAQArySUM
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID US11764119B2
GroupedDBID EVB
ID FETCH-epo_espacenet_US11764119B23
IEDL.DBID EVB
IngestDate Fri Jul 19 14:22:00 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US11764119B23
Notes Application Number: US202217672939
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230919&DB=EPODOC&CC=US&NR=11764119B2
ParticipantIDs epo_espacenet_US11764119B2
PublicationCentury 2000
PublicationDate 20230919
PublicationDateYYYYMMDD 2023-09-19
PublicationDate_xml – month: 09
  year: 2023
  text: 20230919
  day: 19
PublicationDecade 2020
PublicationYear 2023
RelatedCompanies SAMSUNG ELECTRONICS CO., LTD
RelatedCompanies_xml – name: SAMSUNG ELECTRONICS CO., LTD
Score 3.4948277
Snippet A method of manufacturing an integrated circuit device, the method including forming a plurality of target patterns on a substrate such that an opening is...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Integrated circuit devices
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230919&DB=EPODOC&locale=&CC=US&NR=11764119B2
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwY2BQMUtMSksyTErUNbFMsdQ1MTZK0U0Etjt0Uy3TQO15U-PUJNBuZF8_M49QE68I0wgmhizYXhjwOaHl4MMRgTkqGZjfS8DldQFiEMsFvLayWD8pEyiUb-8WYuuiBu0dA9vTlsAc6OJk6xrg7-LvrObsbBsarOYXZGtoaG5mYmho6QQsrlmBzWhzUG5wDXMC7UopQK5S3AQZ2AKApuWVCDEwpeYJM3A6w25eE2bg8IVOeAOZ0LxXLMIg5Qk72SFFITmzKLk0s0QhJRWc0UUZFN1cQ5w9dIGWxMN9FB8ajHCPsRgDC7CnnyrBoABsjRmkWBikmKUZm5qkGiUnJpknWZpZmCSlGBmnJKaaSzJI4TZHCp-kNAMXKHRACx0MLWUYWEqKSlNlgbVpSZIcOBgADJR4xw
link.rule.ids 230,309,783,888,25576,76876
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3dS8MwED_GFOebTkXrVwXpW3Fdv5aHIvSLTveFa2VvpWlSmA9zbB3--15D63zRt5DAJTn43f2S3F0AHq2MFlSjmWoQRlRD7zM1Q96hclJUfN7UOa2ykccTK0qMl4W5aMFHkwsj6oR-ieKIiKgc8V4Ke73eX2L5IrZy-0SX2PX5HMaOr9SnY-TTBBHou04wm_pTT_E8J5krkzdH02zL0DTiork-QIptV2gI3t0qK2X926WEJ3A4Q2mr8hRafNWFjtf8vNaFo3H94I3NGnvbM5CGTWUHJufLTb5bljLjAujn8BAGsRepOEn6s6M0me_Xo19AG0_6_BJkZGM9Nugxq9BNg_fzjNqUWAODsr7OMm5fgfS3HOm_wXvoRPF4lI6Gk9drOK40VQU9aOQG2uVmx2_Rs5b0TqjkG-CIe7o
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Integrated+circuit+devices&rft.inventor=Kim%2C+Munjun&rft.inventor=Lee%2C+Seungheon&rft.inventor=Han%2C+Taejong&rft.inventor=Koh%2C+Jaekang&rft.inventor=Kwon%2C+Hyukwoo&rft.date=2023-09-19&rft.externalDBID=B2&rft.externalDocID=US11764119B2