Method for decision making in a semiconductor manufacturing process

A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators...

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Bibliographic Details
Main Authors Kunnen, Johan Gertrudis Cornelis, Tsirogiannis, Georgios, Gonzalez Huesca, Juan Manuel, Davies, Dylan John David, Pongers, Willem Richard, Li, Chung-Hsun, De Jong, Frederik Eduard, Hlod, Andriy, Hubaux, Arnaud, Borger, Hendrik Cornelis Anton, Pisarenco, Maxim, Beckers, Johan Franciscus Maria, Daware, Ajinkya Ravindra
Format Patent
LanguageEnglish
Published 27.06.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CALCULATING
CINEMATOGRAPHY
COMPUTING
COUNTING
ELECTRIC DIGITAL DATA PROCESSING
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:A method for categorizing a substrate subject to a semiconductor manufacturing process including multiple operations, the method including: obtaining values of functional indicators derived from data generated during one or more of the multiple operations on the substrate, the functional indicators characterizing at least one operation; applying a decision model including one or more threshold values to the values of the functional indicators to obtain one or more categorical indicators; and assigning a category to the substrate based on the one or more categorical indicators.
Bibliography:Application Number: US202017423325