Method of preparing an isolation region in a high resistivity silicon-on-insulator substrate

• Main Authors: Libbert, Jeffrey L, Peidous, Igor
• Format: Patent
• Language: English
• Published: 21.02.2023
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

A multilayer composite structure and a method of preparing a multilayer composite structure are provided. The multilayer composite structure comprises a semiconductor handle substrate having a minimum bulk region resistivity of at least about 500 ohm-cm and an isolation region that impedes the trans...