Photomask assembly with reflective photomask and method of manufacturing a reflective photomask
A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate...
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| Main Authors | , , |
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| Format | Patent |
| Language | English |
| Published |
27.12.2022
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| Subjects | |
| Online Access | Get full text |
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| Abstract | A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius. |
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| AbstractList | A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer on a first substrate surface of the substrate at a front side of the reflective photomask. The protection structure is on a second substrate surface of the substrate at a backside of the reflective photomask, and is detachable from the reflective photomask at a temperature below 150 degree Celsius. |
| Author | Schenke, Andreas Schedel, Thorsten Bender, Markus |
| Author_xml | – fullname: Schedel, Thorsten – fullname: Bender, Markus – fullname: Schenke, Andreas |
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| Notes | Application Number: US202016739555 |
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| RelatedCompanies | Advanced Mask Technology Center GmbH & Co. KG |
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| Snippet | A photomask mask assembly includes a reflective photomask and a protection structure. The reflective photomask includes a substrate and a reflective multilayer... |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| Title | Photomask assembly with reflective photomask and method of manufacturing a reflective photomask |
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