Substrate processing apparatus and method of manufacturing display panel using the same

A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second t...

Full description

Saved in:
Bibliographic Details
Main Authors Park, Jonghee, Kim, Youngdae, Kim, Jinseock
Format Patent
LanguageEnglish
Published 22.11.2022
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

Abstract A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.
AbstractList A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber to supply a first chemical to the first process chamber, a second process chamber in which the target substrate is processed, and a second tank connected to the second process chamber to supply a second chemical to the second process chamber. A metal ion contained in the first chemical supplied to the first process chamber has an ion concentration greater than an ion concentration of the metal ion contained in the second chemical supplied to the second process chamber.
Author Kim, Jinseock
Park, Jonghee
Kim, Youngdae
Author_xml – fullname: Park, Jonghee
– fullname: Kim, Youngdae
– fullname: Kim, Jinseock
BookMark eNqNizkOwkAMALeAgusP5gFIJIijBoHoA6KMTNZLIiVeK_YW_J5DPIBqpNHM2A04Mo3crUh3tR6NQPpYkWrDD0ARfLukgOyhI6ujhxigQ04BK0v9p_KNSotPEGRqIX1PqwkUO5q6YcBWafbjxM1Px8vhvCCJJalgRUxWXossWy93202-z1f_NC_7Wjxn
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
ExternalDocumentID US11508762B2
GroupedDBID EVB
ID FETCH-epo_espacenet_US11508762B23
IEDL.DBID EVB
IngestDate Fri Jul 19 14:59:29 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US11508762B23
Notes Application Number: US202117159518
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221122&DB=EPODOC&CC=US&NR=11508762B2
ParticipantIDs epo_espacenet_US11508762B2
PublicationCentury 2000
PublicationDate 20221122
PublicationDateYYYYMMDD 2022-11-22
PublicationDate_xml – month: 11
  year: 2022
  text: 20221122
  day: 22
PublicationDecade 2020
PublicationYear 2022
RelatedCompanies Samsung Display Co., Ltd
RelatedCompanies_xml – name: Samsung Display Co., Ltd
Score 3.441601
Snippet A substrate processing apparatus includes a first process chamber in which a target substrate is processed, a first tank connected to the first process chamber...
SourceID epo
SourceType Open Access Repository
SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Substrate processing apparatus and method of manufacturing display panel using the same
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221122&DB=EPODOC&locale=&CC=US&NR=11508762B2
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1dS8MwFL2MKeqbTkXnBxGkb0Vtm2kfirB2Ywj7wG26t5EmKWxsabEt4r_3JtucL_oWEhLSG07uvU3OCcAtFT73uM9syhkmKLFk9lMiqM246zEufSrMSnd7jc7Ye5nQSQXmGy6M0Qn9NOKIiCiOeC_Mfp1tf2JF5m5lfhfPsCp9bo-CyFpnxw6mM45jRc2gNehH_dAKw2A8tHqvgQ58NPCbuF3v6DBa6-y33pqalZL9dintQ9gd4GiqOIKKVDXYDzcvr9Vgr7s-8MbiGnv5MbxrjBstWZKtbvej1yEsM-LdZU6YEmT1HjRJE7JkqtSkBcNCJGKWZwv2RRD6ckFK0xMjP5KzpTyBm3ZrFHZsnOH0xxzT8XD7Me4pVFWq5BmQBiY-9JHLe_YgPE_SWCbou12WcOFijJKcQ_3vcer_NV7AgTatZuA5ziVUi49SXqErLuJrY8NvaXGQnQ
link.rule.ids 230,309,786,891,25594,76903
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV3fT8IwEL4QNOKbokbxV03M3hZ1W8E9LCZsEFR-RUB5I13bJRgYi9ti_O-9FhBf9G3psqa95evd1953BbimwuUOd5lJOUOCEkpm3keCmozbDuPSpUL_6U632ho5T2M6LsD7Wguj64R-6uKIiCiOeM_0ep1sNrECnVuZ3oRTbFo8NIdeYKzYsYV0xrKMoO41-r2g5xu-740GRvfFU4GPAn4dl-utGlJCTZVe60qVkvx2Kc092O5jb3G2DwUZl6Hkr29eK8NOZ3XgjY8r7KUH8KYwrmvJkmSZ3Y9eh7BEF-_OU8JiQZb3QZNFROYszpVoQasQiZimyYx9EYS-nJFcf4mRH0nZXB7CVbMx9FsmjnDyY47JaLCZjH0ExXgRy2MgVSQ-tMblLbsTjiNpKCP03TaLuLAxRolOoPJ3P5X_Xl5CqTXstCftx-7zKewqMys1nmWdQTH7yOU5uuUsvND2_AZSQpOH
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Substrate+processing+apparatus+and+method+of+manufacturing+display+panel+using+the+same&rft.inventor=Park%2C+Jonghee&rft.inventor=Kim%2C+Youngdae&rft.inventor=Kim%2C+Jinseock&rft.date=2022-11-22&rft.externalDBID=B2&rft.externalDocID=US11508762B2