Defect offset correction
A method includes: receiving a defect map from a defect scanner, wherein the defect map comprises at least one defect location of a semiconductor workpiece; annotating the defect map with a reference fiducial location of the semiconductor workpiece; determining a detected fiducial location within im...
Saved in:
Main Authors | , , , , , |
---|---|
Format | Patent |
Language | English |
Published |
30.08.2022
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!