Defect offset correction

A method includes: receiving a defect map from a defect scanner, wherein the defect map comprises at least one defect location of a semiconductor workpiece; annotating the defect map with a reference fiducial location of the semiconductor workpiece; determining a detected fiducial location within im...

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Bibliographic Details
Main Authors Hsueh, Ya-Hsun, Chuang, Sheng-Hsiang, Pai, Jiun-Rong, Liao, Chien-Ko, Kuo, Shou-Wen, Liu, Hsu-Shui
Format Patent
LanguageEnglish
Published 30.08.2022
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