Mask inspection of a semiconductor specimen
There is provided a mask inspection system and a method of mask inspection. The method comprises: during a runtime scan of a mask of a semiconductor specimen, processing a plurality of aerial images of the mask acquired by the mask inspection system to calculate a statistic-based Edge Positioning Di...
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Main Authors | , , , , , , , |
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Format | Patent |
Language | English |
Published |
31.05.2022
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Subjects | |
Online Access | Get full text |
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