Charged particle beam apparatus
To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning defle...
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Main Authors | , , , , |
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Format | Patent |
Language | English |
Published |
28.12.2021
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Subjects | |
Online Access | Get full text |
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Abstract | To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam. |
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AbstractList | To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus according to the invention includes: a charged particle beam source configured to irradiate a sample with a primary particle beam; a scanning deflector configured to scan and deflect the primary particle beam to a desired position of the sample; and a detector configured to detect secondary particles emitted from the desired position. The charged particle beam apparatus further includes: a focusing lens electrode arranged coaxially with the primary particle beam and configured to generate a focusing electric field that is an electric field that focuses a trajectory of the secondary particles; and a mesh electrode configured to reduce leakage of the focusing electric field on a trajectory of the primary particle beam. |
Author | Okai, Nobuhiro Suzuki, Naomasa Shojo, Tomoyasu Bizen, Daisuke Fukuda, Muneyuki |
Author_xml | – fullname: Okai, Nobuhiro – fullname: Bizen, Daisuke – fullname: Suzuki, Naomasa – fullname: Fukuda, Muneyuki – fullname: Shojo, Tomoyasu |
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Notes | Application Number: US201817049353 |
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RelatedCompanies | HITACHI HIGH-TECH CORPORATION |
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Snippet | To improve detection efficiency of secondary particles without increasing a size of a charged particle beam apparatus, a charged particle beam apparatus... |
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Title | Charged particle beam apparatus |
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