Method and device for characterizing a mask for microlithography
A method and a device for characterizing a mask for microlithography in a characterization process carried out using an optical system, wherein the optical system includes an illumination optical unit and an imaging optical unit and wherein in the characterization process structures of the mask are...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
30.11.2021
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Subjects | |
Online Access | Get full text |
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Abstract | A method and a device for characterizing a mask for microlithography in a characterization process carried out using an optical system, wherein the optical system includes an illumination optical unit and an imaging optical unit and wherein in the characterization process structures of the mask are illuminated by the illumination optical unit, the mask is imaged onto a detector unit by the imaging optical unit and image data recorded by the detector unit are evaluated in an evaluation unit. A method includes the following steps: determining a temporal variation of at least one variable that is characteristic of the thermal state of the optical system, and modifying the characterization process depending on the temporal variation determined. |
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AbstractList | A method and a device for characterizing a mask for microlithography in a characterization process carried out using an optical system, wherein the optical system includes an illumination optical unit and an imaging optical unit and wherein in the characterization process structures of the mask are illuminated by the illumination optical unit, the mask is imaged onto a detector unit by the imaging optical unit and image data recorded by the detector unit are evaluated in an evaluation unit. A method includes the following steps: determining a temporal variation of at least one variable that is characteristic of the thermal state of the optical system, and modifying the characterization process depending on the temporal variation determined. |
Author | Kamp-Froese, Michael Mueller, Tobias Koch, Markus |
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Snippet | A method and a device for characterizing a mask for microlithography in a characterization process carried out using an optical system, wherein the optical... |
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Title | Method and device for characterizing a mask for microlithography |
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