Measurement system, lithographic apparatus and device manufacturing method
A measurement system to determine a deformation of an object having a front surface, a back surface and a pattern. The measurement system includes a processor system and an interferometer system. The interferometer system has a radiation source and a detector system. The source is configured to emit...
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Main Authors | , , , , , , |
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Format | Patent |
Language | English |
Published |
18.05.2021
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Subjects | |
Online Access | Get full text |
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