Method and apparatus for angular-resolved spectroscopic lithography characterization

An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity o...

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Bibliographic Details
Main Authors Bleeker, Arno Jan, Grouwstra, Cedric Desire, Den Boef, Arie Jeffrey, Van Der Schaar, Maurits, Van Dommelen, Youri Johannes Laurentius Maria, Kiers, Antoine Gaston Marie, Van Kraaij, Markus Gerardus Martinus Maria, Dusa, Mircea, Luehrmann, Paul Frank, Pellemans, Henricus Petrus Maria
Format Patent
LanguageEnglish
Published 23.03.2021
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MATERIALS THEREFOR
MEASURING
MEASURING ANGLES
MEASURING AREAS
MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
TESTING
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Summary:An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
Bibliography:Application Number: US201916270155