Method of measuring a structure, inspection apparatus, lithographic system, device manufacturing method and wavelength-selective filter for use therein
A scatterometer performs diffraction based measurements of one or more parameters of a target structure. To make two-color measurements in parallel, the structure is illuminated simultaneously with first radiation (302) having a first wavelength and a first angular distribution and with second radia...
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Main Authors | , , |
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Format | Patent |
Language | English |
Published |
15.09.2020
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Subjects | |
Online Access | Get full text |
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