Layouts for connecting contacts with metal tabs or vias
The present disclosure relates to methodologies for designing semiconductor structures, and, more particularly, creating a methodology to connect contacts of semiconductor elements to a metal line using marker tabs to reserve space for future connections between the contacts and the metal line, and...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
23.06.2020
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Subjects | |
Online Access | Get full text |
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Summary: | The present disclosure relates to methodologies for designing semiconductor structures, and, more particularly, creating a methodology to connect contacts of semiconductor elements to a metal line using marker tabs to reserve space for future connections between the contacts and the metal line, and then reassigning the marker tabs to connections between the contacts and the metal line on different levels of a metal stack formed over the semiconductor elements. |
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Bibliography: | Application Number: US201715644288 |