Lithographic apparatus and device manufacturing method
In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
15.10.2019
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Subjects | |
Online Access | Get full text |
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