EUV exposure apparatus with reflective elements having reduced influence of temperature variation

• Main Authors: Stickel, Franz-Josef, Hauf, Markus, Baer, Norman, Laufer, Timo, Wittich, Gero, Van Schoot, Jan, Limbach, Guido, Kwan, Yim-Bun-Patrick, Loering, Ulrich, Natt, Oliver, Hembacher, Stefan, Kuerz, Peter, Walter, Holger
• Format: Patent
• Language: English
• Published: 11.06.2019
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HOLOGRAPHY; IRRADIATION DEVICES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES; MATERIALS THEREFOR; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; NANOTECHNOLOGY; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR; TRANSPORTING

A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of...