Method of patterning intersecting structures

Provided is a method of patterning structures on a substrate using an integration scheme in a patterning system, the method comprising: disposing a substrate in a processing chamber, the substrate having a plurality of structures and a pattern, the substrate including an underlying layer and a targe...

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Bibliographic Details
Main Authors Voronin, Sergey A, Ranjan, Alok, Talone, Christopher
Format Patent
LanguageEnglish
Published 12.02.2019
Subjects
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