Method of patterning intersecting structures
Provided is a method of patterning structures on a substrate using an integration scheme in a patterning system, the method comprising: disposing a substrate in a processing chamber, the substrate having a plurality of structures and a pattern, the substrate including an underlying layer and a targe...
Saved in:
Main Authors | , , |
---|---|
Format | Patent |
Language | English |
Published |
12.02.2019
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Be the first to leave a comment!