Three-dimensional memory device having conductive support structures and method of making thereof

An alternating stack of insulating layers and sacrificial material layers is formed over a horizontal layer, which can be formed over a lower-interconnect-level dielectric material layer overlying a substrate. Structural integrity of insulating layers vertically spaced from one another by backside r...

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Bibliographic Details
Main Authors Ogawa, Hiroyuki, Masamori, Yohei
Format Patent
LanguageEnglish
Published 30.10.2018
Subjects
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