Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength lambda includes a number N of dioptric optical elements, each...
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Format | Patent |
Language | English |
Published |
16.10.2018
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Abstract | An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength lambda includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion lambdani=ni(lambda0)-ni(lambda0+1 pm) for a wavelength variation of 1 pm from a wavelength lambda0. The objective satisfies the relation ∑ i = 1 N Delta n i ( s i - d i ) lambda 0 NA 4 <= A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected. |
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AbstractList | An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength lambda includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion lambdani=ni(lambda0)-ni(lambda0+1 pm) for a wavelength variation of 1 pm from a wavelength lambda0. The objective satisfies the relation ∑ i = 1 N Delta n i ( s i - d i ) lambda 0 NA 4 <= A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected. |
Author | Epple, Alexander Rostalski, Hans-Juergen Feldmann, Heiko |
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Snippet | An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture... |
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SubjectTerms | ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
Title | Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same |
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