Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same

• Main Authors: Rostalski, Hans-Juergen, Feldmann, Heiko, Epple, Alexander
• Format: Patent
• Language: English
• Published: 16.10.2018
• Subjects: ACCESSORIES THEREFOR; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM; APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength lambda includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion lambdani=ni(lambda0)-ni(lambda0+1 pm) for a wavelength variation of 1 pm from a wavelength lambda0. The objective satisfies the relation  ∑ i = 1 N  Delta   n i  ( s i - d i )  lambda 0  NA 4 <= A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.