Method of manufacturing photomask

A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.

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Bibliographic Details
Main Authors Oh, Jong-Keun, Kim, Byung-Gook, Ko, Hyung-Ho, Choi, Jae-Hyuck, Choi, Jun-Youl
Format Patent
LanguageEnglish
Published 07.08.2018
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Abstract A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
AbstractList A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Author Ko, Hyung-Ho
Choi, Jae-Hyuck
Oh, Jong-Keun
Kim, Byung-Gook
Choi, Jun-Youl
Author_xml – fullname: Oh, Jong-Keun
– fullname: Kim, Byung-Gook
– fullname: Ko, Hyung-Ho
– fullname: Choi, Jae-Hyuck
– fullname: Choi, Jun-Youl
BookMark eNrjYmDJy89L5WRQ9E0tychPUchPU8hNzCtNS0wuKS3KzEtXKMjIL8nPTSzO5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8aHBhgYGJkZGJmZORsbEqAEAei4nwA
ContentType Patent
DBID EVB
DatabaseName esp@cenet
DatabaseTitleList
Database_xml – sequence: 1
  dbid: EVB
  name: esp@cenet
  url: http://worldwide.espacenet.com/singleLineSearch?locale=en_EP
  sourceTypes: Open Access Repository
DeliveryMethod fulltext_linktorsrc
Discipline Medicine
Chemistry
Sciences
Physics
ExternalDocumentID US10042246B2
GroupedDBID EVB
ID FETCH-epo_espacenet_US10042246B23
IEDL.DBID EVB
IngestDate Fri Jul 19 15:44:39 EDT 2024
IsOpenAccess true
IsPeerReviewed false
IsScholarly false
Language English
LinkModel DirectLink
MergedId FETCHMERGED-epo_espacenet_US10042246B23
Notes Application Number: US201615225918
OpenAccessLink https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180807&DB=EPODOC&CC=US&NR=10042246B2
ParticipantIDs epo_espacenet_US10042246B2
PublicationCentury 2000
PublicationDate 20180807
PublicationDateYYYYMMDD 2018-08-07
PublicationDate_xml – month: 08
  year: 2018
  text: 20180807
  day: 07
PublicationDecade 2010
PublicationYear 2018
RelatedCompanies SAMSUNG ELECTRONICS CO., LTD
RelatedCompanies_xml – name: SAMSUNG ELECTRONICS CO., LTD
Score 3.1648145
Snippet A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern,...
SourceID epo
SourceType Open Access Repository
SubjectTerms APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
Title Method of manufacturing photomask
URI https://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20180807&DB=EPODOC&locale=&CC=US&NR=10042246B2
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1ZS8NAEB5KPd80KloPUpC8BYndJOQhCLkoQtpiG-lbScIuHpgEs8W_78ySWl_0dRb2grl25_sG4JYJ9LoeL0wnL5mJ8S0zc8Yt07Y4c5gr8pwRGjmdOOOMPS7tZQ_eNlgYxRP6pcgRUaNK1Hep7HWzfcSKVG1le1e8oqh-SBZ-ZHTZsUUsia4RBX48m0bT0AhDP5sbkyffUmRXzAnQXO9QGE08-_FzQKiU5rdLSY5gd4azVfIYerzS4CDcdF7TYD_tPrw12FMVmmWLwk4L2xMYpqrts14L_SOv1oRNUGBDvXmpJdX7vJ_CMIkX4djEVVc_R1xl8-0GR2fQx9Sfn4NuE8OTGFFrTsKsC88rMUDh3n3BPCac4gIGf88z-G_wEg7pulQpm3sFffm55tfoXmVxo-7lG-_DfQ4
link.rule.ids 230,309,786,891,25594,76904
linkProvider European Patent Office
linkToHtml http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwfV1LT4NAEJ409VFvihqtL5oYbsRgFwgHYgKUoBbaWDC9ESC78RGBCI1_39kNtV70OpvsK5nX7nzfAFwThl7XorlqZAVRMb4lakaopuoaJQYxWZYRjkYOIyNIyMNSX_bgbY2FETyhX4IcETWqQH1vhb2uN49YnqitbG7yVxRVd35se0qXHWucJdFUPMeezGfezFVc104WSvRka4LsihgOmustE1NCzrM_eXY4KqX-7VL8fdie42xlewA9WkowcNed1yTYDbsPbwl2RIVm0aCw08LmEEahaPssV0z-yMoVxyYIsKFcv1Qtr_d5P4KRP4ndQMVV058jpslis8HxMfQx9acnIOuc4YmNeWtOjllnllVggEKt25xYhBn5KQz_nmf43-AVDII4nKbT--jxDPb41YmyNvMc-u3nil6gq23zS3FH3-5Uf_k
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Apatent&rft.title=Method+of+manufacturing+photomask&rft.inventor=Oh%2C+Jong-Keun&rft.inventor=Kim%2C+Byung-Gook&rft.inventor=Ko%2C+Hyung-Ho&rft.inventor=Choi%2C+Jae-Hyuck&rft.inventor=Choi%2C+Jun-Youl&rft.date=2018-08-07&rft.externalDBID=B2&rft.externalDocID=US10042246B2