Systems and methods for improved semiconductor etching and component protection

• Main Authors: LUBOMIRSKY, DMITRY, PARK, SOONAM, CHOY, MARTIN YUE, JUNG, SOONWOOK, LOH, LOK KEE, TAN, TIEN FAK
• Format: Patent
• Language: Chinese; English
• Published: 01.07.2024
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Semiconductor systems and methods may include a semiconductor processing chamber having a gas box defining an access to the semiconductor processing chamber. The chamber may include a spacer characterized by a first surface with which the gas box is coupled, and the spacer may define a recessed ledg...