Method for measuring and correcting misregistration between layers in a semiconductor device, and misregistration targets useful therein

A method for measurement of misregistration in the manufacture of semiconductor device wafers, the method including measuring misregistration between layers of a semiconductor device wafer at a first instance and providing a first misregistration indication, measuring misregistration between layers...

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Bibliographic Details
Main Authors VOLKOVICH, ROIE, ZABERCHIK, MORAN, YERUSHALMI, LIRAN, MILO, RENAN, IZRAELI, DAVID, FELER, YOEL
Format Patent
LanguageChinese
English
Published 21.03.2024
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