Metal mask and the method to produce metal mask

A metal mask includes a metal panel, provided with an evaporation surface and a back surface opposite to each other and a plurality of through holes extending from the evaporation surface to the back surface. A size of each through hole decreases gradually from the evaporation surface towards the ba...

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Bibliographic Details
Main Authors LIN, CHI-WEI, LIU, KANG-HSIANG
Format Patent
LanguageChinese
English
Published 11.11.2023
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:A metal mask includes a metal panel, provided with an evaporation surface and a back surface opposite to each other and a plurality of through holes extending from the evaporation surface to the back surface. A size of each through hole decreases gradually from the evaporation surface towards the back surface. A first opening is formed by each through hole in the evaporation surface. The first opening includes a primary opening part and a plurality of secondary opening parts. The primary opening part is provided with two long edges opposite to each other and two short edges opposite to each other. The two short edges are connected between the two long edges, and the secondary opening parts are connected at two ends of the long edges. Each secondary opening part has a width perpendicular to the length. A method to produce the metal mask is also provided.
Bibliography:Application Number: TW202211147434