TWI799809B

• Main Authors: OOUCHI, SATOSHI, HAMADA, RYO, TSUBOKAWA, NAOFUMI, OOHIRA, TAKASHI, AIZAWA, MOTOHIRO, YOSHIKAWA, HIROO, KAZAMA, MASAHIKO, OTA, NOBUYUKI, HOSOKAWA, HIDEYUKI
• Format: Patent
• Language: Chinese
• Published: 21.04.2023
• Subjects: DECONTAMINATION ARRANGEMENTS THEREFOR; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; PHYSICS; PROTECTION AGAINST X-RADIATION, GAMMA RADIATION, CORPUSCULARRADIATION OR PARTICLE BOMBARDMENT; TREATING RADIOACTIVELY CONTAMINATED MATERIAL

Provided are a chemical decontamination method and a chemical decontamination apparatus capable of preventing deterioration of a metal ion exchange resin and performing decontamination at a low cost in a short time.The chemical decontamination method of the invention includes: a reduction decontamination step of supplying a reduction decontamination solution to a decontamination target portion and performing reduction decontamination on a surface of a member constituting the decontamination target portion; a hydrogen peroxide decomposition step of decomposing hydrogen peroxide contained in the reduction decontamination solution after the reduction decontamination step; and a metal ion removing step of removing a metal ion contained in the reduction decontamination solution after the hydrogen peroxide decomposition step.