Support, vibration isolation system, lithographic apparatus, object measurement apparatus, device manufacturing method

• Main Authors: VERMEULEN, JOHANNES PETRUS MARTINUS BERNARDUS, VAN DER MEULEN, STAN HENRICUS, VAN DE WIJDEVEN, JEROEN JOHAN MAARTEN, STARREVELD, JEROEN PIETER
• Format: Patent
• Language: Chinese; English
• Published: 01.04.2023
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

The invention provides a support with first and second end portions. The second end portion is on the side opposite to the first end portion in a longitudinal direction of the support. A coil spring is arranged between the first and second end portions. The coil spring comprises a first spiral membe...