TWI789365B
A slurry comprises abrasive grains, a glycol, and water, wherein an average particle diameter of the abrasive grains is 120 nm or smaller, and a pH is 4.0 or higher and lower than 8.0. A polishing method comprises a step of polishing a metal by use of the slurry.
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Main Author | |
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Format | Patent |
Language | Chinese |
Published |
11.01.2023
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Subjects | |
Online Access | Get full text |
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