Positive-type photosensitive resin composition for micro lens pattern production and application thereof

• Main Authors: GONSUI, SHINOBU, MATSUMOTO, NAOZUMI, IKEDA, YURI, INOUE, TOMOYUKI, ISOBE, SHINGO
• Format: Patent
• Language: Chinese; English
• Published: 21.10.2021
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CHEMISTRY; CINEMATOGRAPHY; COMPOSITIONS BASED THEREON; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS; MATERIALS THEREFOR; METALLURGY; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS; OPTICS; ORGANIC MACROMOLECULAR COMPOUNDS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; THEIR PREPARATION OR CHEMICAL WORKING-UP

The present invention provides a photosensitive resin composition which can cope with various exposure conditions and is applicable to making an industrial process for forming a micro lens efficient, and an application thereof. The positive-type photosensitive resin composition for micro lens pattern production according to the present invention is characterized by comprising a resin (A) that has an acid dissociable dissolution inhibiting group and increases solubility to alkali by the action of acid, a compound (B) that includes a functional group for crosslinking the resin (A), and a photoacid generator (C). The photoacid generator (C) has light absorbance of 0.6 or more at a wavelength of 365 nm and a light absorbance of 0.75 or more at a wavelength of 248 nm. The light absorbance is measured at the following condition. The condition is that light absorbance of a propylene glycol monomethyl ether solution of the photoacid generator (C) having a weight mole concentration of 8.18x10-5 mol/kg is measured unde