Cleaning method and apparatus

Methods for cleaning at least one soiled substrate in a rotatably mounted cylindrical drum of a cleaning apparatus with a multiplicity of solid particles are provided. One method includes the steps of: agitating the at least one soiled substrate in the drum with wash liquor and the multiplicity of s...

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Bibliographic Details
Main Authors SAWFORD, MICHAEL, WELLS, SIMON PAUL, SZYMCZYK, WAYNE ROBERT, JENKINS, STEPHEN DEREK, ABERCROMBIE, ELIZABETH JEAN
Format Patent
LanguageChinese
English
Published 11.01.2019
Subjects
FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
LAUNDERING
LAUNDERING, DRYING, IRONING, PRESSING OR FOLDING TEXTILEARTICLES
TEXTILES
TREATMENT OF TEXTILES OR THE LIKE
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Summary:Methods for cleaning at least one soiled substrate in a rotatably mounted cylindrical drum of a cleaning apparatus with a multiplicity of solid particles are provided. One method includes the steps of: agitating the at least one soiled substrate in the drum with wash liquor and the multiplicity of solid particles for a first cleaning cycle wherein the wash liquor includes at least one cleaning agent; draining the wash liquor from the cleaning apparatus; and introducing an aqueous non-detergent medium into the cleaning apparatus and agitating the at least one soiled substrate with the multiplicity of solid particles in the drum for a second cleaning cycle. Another method includes rotating the drum such that the at least one soiled substrate moves about a generally circular path and introducing the multiplicity of solid particles into the drum through an annulus defined by the generally circular path as the drum rotates.
Bibliography:Application Number: TW20143138940