Cylindrical polymer mask and method of fabrication, method of lithography, substrate, rotatable mask and method of fabrication, master mold and method for forming master mold, and cylindrical master mold assembly and method for forming cylindrical mask w

• Main Authors: RICHARDSON, BRUCE, ARYAL, MUKTI, MCMACKIN, IAN, GRIGSBY, BRYANT, KOBRIN, BORIS, SIETZ, OLIVER
• Format: Patent
• Language: Chinese; English
• Published: 21.04.2018
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

A cylindrical mask may be fabricated using a hollow casting cylinder and a mask cylinder. The casting cylinder has an inner diameter that is larger than the outer diameter of the mask cylinder. The casting and mask cylinders are coaxially assembled and a liquid polymer inserted in a space surroundin...