TWI619195B

• Main Authors: LUAN, DA-WEI, LI, ZONG-XING, LI, DONG-SAN, LIU, LI-JIAN, YANG, ZHI-HUI, GAO, FU-BAO, ZHANG, BAO-HUI
• Format: Patent
• Language: Chinese
• Published: 21.03.2018
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

Disclosed are a substrate bearing device (20) and plasma processing equipment. An upper surface of the substrate bearing device (20) is provided with a plurality of substrate mounting locations (201), and heat-exchange gas inlet passages (23, 24, 25) are arranged in the substrate bearing device (20)...