Template, surface processing method of template, surface processing apparatus of template, and pattern formation method
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| Main Authors | , , , |
|---|---|
| Format | Patent |
| Language | Chinese English |
| Published |
11.08.2015
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| Subjects | |
| Online Access | Get full text |
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| Author | HIRABAYASHI, HIDEAKI HIGA, MOMOKA KAWAMURA, YOSHIHISA KOBAYASHI, MASAKO |
|---|---|
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| RelatedCompanies | KABUSHIKI KAISHA TOSHIBA |
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| SubjectTerms | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT OF NANOSTRUCTURES MATERIALS THEREFOR MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES TRANSPORTING |
| Title | Template, surface processing method of template, surface processing apparatus of template, and pattern formation method |
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