Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications

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Main Authors MIKHAYLICHENKO, KATRINA, PODLESNIKAGAN, SABBA, YIZHAK
Format Patent
LanguageChinese
English
Published 01.01.2014
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Author PODLESNIKAGAN
SABBA, YIZHAK
MIKHAYLICHENKO, KATRINA
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SubjectTerms BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Title Method and apparatus for surface treatment of semiconductor substrates using sequential chemical applications
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